Highly tunable self-assembled plasmonic lattices through nanosphere lithography

Abstract

This Letter reports a method to produce two-dimensional self-assembled plasmonic nanopillar (NP) arrays with independent control of the diameter (d), spacing (s), and height (h) of the NPs. A plasmonic lattice was designed and optimized for maximum plasmonic activity at 980 nm using three-dimensional finite-difference time-domain simulations. The optimized lattice with d=365 nm, s=410 nm, and h=70 nm was fabricated utilizing a self-assembled nanosphere lithography approach. Outstanding agreement between the observed and predicted results confirms the validity of the design process and the controllability and repeatability of the fabrication process. The excellent short-range order in the lattice structure suggests that this method can replace the electron-beam lithography approach in a scalable and cost-effective manner.