Abstract
Graphene films have attracted much attention as a heat dissipation material due to their unique thermal transfer behavior that exceeds that the performance of graphite. However, the very high thermal annealing temperature (~ 3000 °C) required to reduce the graphene oxide (GO) films leads to high manufacturing costs and restricts its broader application in thermal management applications. In this study, a modified-graphene (m-Gr) film was fabricated by vacuum-filtering GO suspensions with added glucose, followed by thermal annealing at 1000 °C. Oxygen-containing functional groups were effectively eliminated during annealing and activated carbon atoms from the decomposition of glucose molecules repaired defects in the graphene sheets to restore large areas of the π-conjugated structure. The as-obtained m-Gr films showed excellent in-plane thermal conductivity ~ 1300 Wm−1 K−1 and much more efficient heat removal than pristine-reduced graphene oxide films. This high thermal conductivity of m-Gr films provides opportunities for their use in next-generation commercial electronics.
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