Abstract
AbstractA new ion beam assisted sputter deposition technique has been developed which facilitates room temperature fabrication of thin ZnO films with exceptional structural order. The well‐defined texture of these films is comparable to films deposited at elevated temperatures of typically 200–300 °C in standard sputter processes. Structural investigations reveal that the applied Xe+ ion bombardment mainly affects the nucleation of ZnO crystallites. The high structural order of the nucleation layer is maintained in subsequent stages of film growth. (© 2009 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)
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