Highly Surface-Textured ZnO:Al Films Fabricated by Controlling the Nucleation and Growth Separately for Solar Cell Applications

Abstract

Highly surface-textured ZnO:Al (AZO) thin films have been fabricated at room temperature by a two-step magnetron sputtering process and using an oxygen-deficient ZnO target with small grain sizes. The as-deposited AZO films are composed of a highly oriented seed layer and a closely packed columnar overlayer with pyramidal growth fronts, supporting a two-step mechanism of crystallite nucleation and grain growth. The structural, optical, and electrical properties of the AZO films can be tuned by the deposition conditions. The optimal two-step AZO film with a maximum root-mean-square roughness of 40.2 nm reaches a very low square resistance of 0.66 Ω/sq (ρ = 1.32 × 10−4 Ω·cm) with an average transparency of 87.9% in the range of 400−1100 nm. The maximum haze factor of the as-deposited film is 60.7% at 360 nm, and the average haze factor is 14.8%. These properties are comparable to or exceed the reported values of surface-textured SnO2- and ZnO-based transparent conducting oxide films, making our films suitable for transparent electrode applications, especially in thin-film solar cells.