Abstract
AbstractThe effects of gallium doping into indium–zinc–tin oxide (IZTO) thin film transistors (TFTs) and Ar/O2 plasma treatment on the performance of a‐IZTO TFT are reported. The Ga doping ratio is varied from 0 to 20%, and it is found that 10% gallium doping in a‐IZTO TFT results in a saturation mobility (µsat) of 11.80 cm2 V−1 s−1, a threshold voltage (Vth) of 0.17 V, subthreshold swing (SS) of 94 mV dec−1, and on/off current ratio (Ion/Ioff) of 1.21 × 107. Additionally, the performance of 10% Ga‐doped IZTO TFT can be further improved by Ar/O2 plasma treatment. It is found that 30 s plasma treatment gives the best TFT performances such as µsat of 30.60 cm2 V−1 s−1, Vth of 0.12 V, SS of 92 mV dec−1, and Ion/Ioff ratio of 7.90 × 107. The bias‐stability of 10% Ga‐doped IZTO TFT is also improved by 30 s plasma treatment. The enhancement of the TFT performance appears to be due to the reduction in the oxygen vacancy and OH concentrations.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
