Abstract
We have optimized low-temperature-grown In0.3Ga0.7As for use in ultrafast photoconductive devices. Using low temperature ex situ annealing techniques, we have produced a photoconductive material that is highly resistive (∼104Ωcm), has sub-500fs carrier trapping lifetimes, and is matched to 1.06μm laser excitation.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
