Abstract
Highly reliable trench capacitor with SiO 2/Si 3N 4/SiO 2 stacked film : T. Watanabe, N. Goto, N. Yasuhisa, T. Yanase, T. Tanaka and S. Shinozaki. Annual Proceedings of the Reliability Physics Symposium, San Diego, U.S.A., p. 50 (1987)
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