Abstract

Graphene is a promising material for use in photodetectors for the ultrawide wavelength region: from ultraviolet to terahertz. Nevertheless, only the 2.3% light absorption of monolayer graphene and fast recombination time of photo-excited charge restrict its sensitivity. To enhance the photosensitivity, hybridization of photosensitive material and graphene has been widely studied, where the accumulated photo-excited charge adjacent to the graphene channel modifies the Fermi level of graphene. However, the charge accumulation process slows the response to around a few tens of seconds to minutes. In contrast, a charge accumulation at the contact would induce the efficient light-induced modification of the contact resistance, which would enhance its photosensitivity. Herein, we demonstrate a highly photosensitive graphene field-effect transistor with noise-equivalent power of ~3 × 10−15 W/Hz1/2 and with response time within milliseconds at room temperature, where the Au oxide on Au electrodes modulates the contact resistance because of the light-assisted relaxation of the trapped charge at the contact. Additionally, this light-induced relaxation imparts an optical memory function with retention time of ~5 s. These findings are expected to open avenues to realization of graphene photodetectors with high sensitivity toward single photon detection with optical memory function.

Highlights

  • Modulating the conductance of the channel through a gating effect[11,12,13]

  • Charge accumulation is necessary to realize high sensitivity in graphene photodetectors, either with or without hybridization of other materials. In these cases using charge accumulation for gating the graphene channel produces a slow response of around seconds to minutes, which is necessary for large-quantity charge accumulation to induce efficient gating[11,12,13,14,15,16]

  • Great efforts have been devoted to improving the electrical contact to the graphene because the contact resistance strongly restricts the G-FET performance[8,10,17,18,19,20,21,22,23,24,25]

Read more

Summary

Introduction

Modulating the conductance of the channel through a gating effect[11,12,13]. This report describes that G-FET with a thin barrier layer of AuOx layer at the contact presented in Fig. 1a exhibits high photosensitivity of ~6.1 × 104 A/W (~25 pA/photon) at room temperature and optical memory function, where the Au oxide layer on the Au electrodes acts as photoinduced variable contact resistance.

Results
Conclusion
Full Text
Paper version not known

Talk to us

Join us for a 30 min session where you can share your feedback and ask us any queries you have

Schedule a call

Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.