Abstract
In this work, phosphorus-doped polycrystalline diamond layers were grown using a new gas control process to increase the incorporation of phosphorus in diamond. Topographical characteristics and crystalline quality of the phosphorus-doped polycrystalline diamond layers grown on Si substrates were analyzed using Scanning Electron Microscopy (SEM) and Raman spectroscopy. The phosphorus concentration was determined using Glow-Discharge Optical Emission Spectroscopy (GDOES). Polycrystalline diamond layers have a good crystalline quality with a sp3/sp2 carbon ration over 75%. The growth rate reaches up to 440 nm∙h−1, and the phosphorus concentration is well above 1020 cm−3. Novelty statementThis work reports on a new method for the production of phosphorus-doped polycrystalline diamond layers based on the pulsed injection of methane during the growth by microwave plasma enhanced chemical vapor deposition.
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