Highly oriented epitaxial Cu2O (011) thin film grown on MgO (001) substrate by dynamic aurora PLD method

Abstract

The epitaxial Cu2O films are grown on MgO (001) substrates by the dynamic aurora pulsed laser deposition (PLD) method. The structure and epitaxial growth of the as-prepared thin films at different substrate temperatures (25 °C to 600 °C) were investigated. The thin film prepared at room temperature (RT, 25 °C) exhibits (111) plane of monoclinic CuO phase with poor crystallinity. The thin films deposited at 200 °C to 600 °C show single-phase cubic Cu2O with good crystallinity. The highly oriented epitaxial Cu2O thin film on the MgO substrate is achieved at low temperatures of 200 °C by applying an induced electromagnetic field during thin film growth. The quality and crystallinity of epitaxial Cu2O thin films remarkably improved with increasing temperature from 200 °C to 600 °C and all these thin films exhibited an out-of-plane epitaxial relationship of Cu2O (011) ‖ MgO (001). The CuO thin film grown on MgO substrate at RT shows a single domain structure, as observed by RHEED. In constrast, Cu2O films grown at 200 °C to 600 °C exhibit two different kinds of domain structure with corresponding in-plane epitaxial relationship of Cu2O [100] ‖ MgO [110] and Cu2O [100] ‖ MgO [11¯0]. This report reveals, for the first time, the feasibility of epitaxial growth of highly oriented Cu2O (011) thin film achieved at the low temperature of 200 °C by the dynamic aurora PLD method. The quality of epitaxial Cu2O (011) is significantly enhanced with increasing substrate temperature from 200 °C to 600 °C.