Abstract
Atomic force microscopy (AFM) was used to investigate the early growth stage of highly ordered para-sexiphenyl thin films deposited by hot wall epitaxy on mica, in order to find the process controlling parameters. It was shown that the growth time and surface type are important parameters for controlling of the film morphology, in terms of the degree of anisotropy and long range order. X-Ray diffraction pole figure technique and transmission electron diffraction was also used to characterize the crystallographic structure of the thicker films.
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