Abstract
We report on highly efficient transmission gratings in fused silica with a grating period of 800 nm generated by electron-beam lithography. At a wavelength of 1060 nm, 95% diffraction efficiency is achieved under Littrow conditions. The damage threshold, extremely enhanced compared with conventional gold-coated diffraction gratings, makes these gratings the key elements in high average power (>100 W) femtosecond fiber chirped-pulse amplification systems.
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