Abstract
In this work, a novel aqueous etching solution was investigated for texturization of silicon substrates. Nearly 30% of incident light is reflected from the surface of crystalline silicon due to its high refractive index. Surface texturization is an efficient practice to reduce surface reflection by enhancing light trapping. Newly formulated etching solution was evaluated for optical reflection, surface morphology and hydrophilicity of silicon substrates. Amazingly, experimental results demonstrate lowest optical reflectance, improved surface morphology as well as enhanced periodicity of the resulting pyramids. A remarkably lowest surface reflectance of 9.94% was achieved. Meanwhile, addition of IPA in the solution plays a major part in improving hydrophilicity of the silicon substrates.
Highlights
Silicon solar cells are most widely used to stream clean, renewable electrical power.[1]
The high optical reflection properties have been reduced by using antireflection coating (ARC),[4] it can be achieved by texturing the front surface of silicon substrates by anisotropic wet etching.[5,6]
We studied the surface morphology, hydrophilicity and measured optical reflectance of each sample etched by a different etching solution
Summary
Silicon solar cells are most widely used to stream clean, renewable electrical power.[1]. We developed a novel, simple and low-cost technique, employing potassium hydroxide (KOH), sodium hydroxide (NaOH) and sodium silicate (Na2SiO3) all together in a specific concentration to achieve better results. Influence of experimental parameters such as KOH, NaOH and Na2SiO3 concentration, temperature of the etching solution during experimental process, effect of etching time on reflectance and surface morphology were studied and compared with other etching solutions. The effect of IPA on the hydrophilicity was examined
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