Abstract
A uniform and pinhole-free hole-blocking layer is necessary for high-performance perovskite-based thin-film solar cells. In this study, we investigated the effect of nanoscale pinholes in compact TiO2 layers on the device performance. Surface morphology and film resistance studies show that TiO2 compact layers fabricated using atomic layer deposition (ALD) contain a much lower density of nanoscale pinholes than layers obtained by spin coating and spray pyrolysis methods. The ALD-based TiO2 layer acts as an efficient hole-blocking layer in perovskite solar cells; it offers a large shunt resistance and enables a high power conversion efficiency of 12.56%.
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