Abstract
An acid-sensitive semiperfluoroalkyl resorcinarene has recently been demonstrated as an effective photoresist for the photolithographic patterning of organic semiconductor materials. In this work, we show that it can be used to pattern polymer solar cells fabricated from a blend of poly(3-hexylthiophene) (P3HT) and [6,6]-phenyl-C61 butyric acid methyl ester (PCBM), so as to obtain high open circuit voltages (Voc). An array of 300 solar cells in series, with a period of 50 µm, achieved a Voc of 90 V and a power conversion efficiency (PCE) of 0.3%.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
