Abstract
Two GexNbTaTiZr (x=0.5, 1) compositions were designed to show excellent thermal stability in amorphous structure. Both amorphous structures in the deposited thin film can be retained after one-hour vacuum annealing at 700°C and 750°C, respectively. Thermodynamic, topological and kinetic factors governing this excellent thermal stability are discussed via high entropy effect, atomic size differences and sluggish diffusion phenomena.
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