Abstract
There is an increasing awareness of the importance of the interrelationship between coating microstructure and properties; however, most of the measurements in the literature relate to room temperature properties. High temperature X-ray diffraction (XRD) studies confirm the importance of microstructure in dictating the properties of physical vapour deposited (PVD) TiN thin films, but in addition illustrate that these changes in coating properties are not usually reversible. Evidence will be presented on the changes in the levels of residual stress and microstrain broadening which arise in PVD TiN films as a function of annealing temperature. These XRD results are discussed in the light of the structural models proposed for PVD TiN thin films.
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