Abstract
High-temperature wetting of natural, high-purity quartz (SiO2) and liquid magnesium (Mg) was investigated at temperatures between 973 and 1273 K. Sessile drop experiments using the capillary purification (CP) procedure were carried out under an Ar gas atmosphere (N6.0), eliminating the native oxide layer on the surface of Mg melt. The results showed that the wetting behavior was strongly dependent on temperature. At 973 and 1073 K, the wetting system displayed relatively large contact angles of 90° and 65°, respectively, demonstrating modest wetting. The wetting increased to some extent by increasing the temperature to 1123 K with a wetting angle of 22°. However, the SiO2/Mg system demonstrated complete wetting at temperatures of 1173 K and above. Furthermore, interface microstructure examination showed different reaction product phases/microstructures, depending on the wetting experiment temperature.
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