High temperature behaviour and oxidation resistance of carbon-boron-nitrogen compounds obtained by LPCVD

Abstract

Coatings of carbon-boron-nitrogen compounds with various compositions are obtained in a low pressure chemical vapour deposition process using acetylene, boron trichloride, ammonia and hydrogen as input gases. Compositions are located in the ternary system C-BN-«BC 3 ». The structure of the films is a graphitic turbostratic one for the whole composition range but carbon-rich deposits exhibit greater coherence length L c than boron nitride-rich ones. The high temperature behaviour is studied for three specific compositions: C 0.82 B 0.14 N 0.04 , C 0.50 B 0.31 N 0.19 and C 0.78 B 0.22 . In an inert atmosphere no mass loss is observed up to 2250 o C while graphitization and formation of boron carbide occur. Based on electron probe micro analysis, depletion of boron and nitrogen happens only in the few micrometers near the surface of the sample. Above 2500 o C, B 12 C 2 evaporates and a graphite-like material is formed. In a dry air atmosphere, oxidation occurs above 800 o C with a slow kinetics. A boron oxide layer protects the sample up to 1000 o C. Above this temperature, volatilization of B 2 O 3 occurs and xidation is greatly enhanced. Of special interest seems to be the C 0.78 B 0.22 coating which exhibits the lowest oxidation rate. Such deposits could then present a way to protect carbon-carbon composites at moderate temperature in the form of an external coating or better of an intermediate layer between fibres and matrix