Abstract

This paper presents the photoresponse characteristics of a high speed Ge nanowires (NWs) network metal-semiconductor-metal photodetector. Ge NWs with different diameters (30 nm–100 nm) were grown by a vapour-liquid-solid method on SiO2/Si (100) wafers. Responsivity up to 1.75 A W−1 has been observed for a 30 nm NWs device compared to 0.5 A W−1 for a 100 nm NWs detector. A large population of surface states results in higher responsivity in a smaller diameter NWs device. The high gain in photocurrent has been explained using back-to-back Schottky junctions in a NWs network. The 30 nm NWs detector shows a fast photoresponse with a rise time of 95 μs and a fall time of 100 μs. The observed diameter-dependent time response in network NWs devices has been explained using barrier-dominant photo-conductance.

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