Abstract
Long-range ordered arrays of anodic alumina nanochannels are grown by anodizing an aluminum covered with a patterned layer of polymethylmethacrylate (PMMA) resist. The two-dimensional hexagonal-closed-packed pattern is created by focused ion beam (FIB) exposure of the PMMA and transferred onto the aluminum surface by phosphoric acid etching. The required exposure time per channel is only ∼20 μs, more than two orders of magnitude reduction in comparison with the previous method employing FIB direct sputtering of the aluminum surface.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
