Abstract
A high fidelity electrochemical replication technique for the rapid fabrication of Alnanostructures with 10 nm lateral resolution has been successfully demonstrated. Aluminumis electrodeposited onto a lithographically patterned Si master using a non-aqueous organichydride bath of aluminum chloride and lithium aluminum hydride at room temperature.Chemical pretreatment of the Si surface allows a clean detachment of the replicated Al foilfrom the master, permitting its repetitive use for mass replication. This high throughputtechnique opens up new possibilities in the fabrication of Al-related nanostructures,including the growth of long range ordered anodic alumina nanochannel arrays.
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