Abstract

Recently, the dynamic performance of piezo-electric deformable "bimorph" mirrors for synchrotron radiation and X-ray free electron laser sources has been characterized and significantly improved. This innovation enables high intensity X-ray beams to be rapidly focused or defocused to either match to the size of the sample under test or to select different sized regions of interest in larger samples. In this paper, we extend these results by monitoring a bimorph mirror using a combination of ex situ metrology instruments. Comparison between results from the Diamond-NOM (Nanometre Optical Metrology) slope profiler, a Fizeau interferometer, and Zygo ZPSTM distance measuring probes shows that bimorph X-ray mirrors can reliably and accurately be driven at 1 Hz using advanced features recently added to the high voltage (HV), bipolar "HV-Adaptos" power supply from CAEN.

Highlights

  • Piezo-electric deformable “bimorph” mirrors[1] have been used for more than two decades to focus X-rays on many synchrotron radiation (SR) beamlines around the world

  • Using an upgraded high voltage (HV) power supply and high-speed ZPS displacement sensing probes, we have shown that bimorph X-ray mirrors can be driven and measured much more rapidly than ever before

  • This could be exploited at synchrotron and free electron laser (FEL) beamlines to rapidly change the size of the X-ray beam at 1 Hz

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Summary

INTRODUCTION

Piezo-electric deformable “bimorph” mirrors[1] have been used for more than two decades to focus X-rays on many synchrotron radiation (SR) beamlines around the world. Following a large change in curvature, numerous metrology studies have shown that bimorph mirrors take more than 15 min to fully stabilize on the single-digit nanometre scale This can cause the size and shape of the reflected X-ray beam to gradually drift. Many SR beamlines, especially those dedicated to macromolecular crystallography, routinely analyze hundreds of samples per day Such beamlines would greatly benefit from the ability to quickly modify the X-ray beam profile in only a few seconds to match to the size of small samples or to vary the illuminated region of larger samples. The small amount of residual curvature drift, caused by piezo-electric creep, was found to be repeatable and could readily be minimized by applying small, dynamic, corrective voltage pulses to the bimorph’s electrodes These innovations enabled the speedy bimorph mirrors to be repeatably driven quickly to a given curvature and remain stabilized indefinitely without the need for continuous metrology feedback. Can X-ray bimorphs work even faster? If so, how much faster? What will be the limiting factor(s) for the maximum speed that can be attained whilst satisfying the stringent nanometer accuracy control required for shaping the optical surface? To investigate, we used three different metrology instruments, including a novel array of high-speed, nano-distance measuring sensors

Bimorph mirror
High voltage bipolar power supply
ZPS absolute distance measuring probes
Monitoring the optical surface of a bimorph mirror
RESULTS AND DISCUSSION
Stability of curvature
Sensitivity
Small voltage increments in the presence of curvature drift
Inducing sub-NM changes in the bimorph’s optical surface
Sinusoidal voltage changes
CONCLUSIONS
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