Abstract
A highly light sensitive, positive tone, low-k dielectric has been developed with excellent lithographic, mechanical, and electrical properties. The photolithographic solubility switching mechanism is based on well-studied, chemically amplified chemistry. The dielectric is composed of a polynorbornene backbone with pendent fluoroalcohol and tert-butyl ester functional groups. The effects of the photoacid generator and monomer ratio on lithographic, mechanical, and electrical properties are studied. The sensitivity (D100 = 8.09 mJ/cm2) and contrast (γ ≥ 14.2) are an order of magnitude higher than existing positive tone dielectrics. The dielectric can be cross-linked via a Fischer esterification after patterning. For one monomer composition (60% fluoroalcohol), the modulus and hardness were measured to be 2.99 GPa and 0.252 GPa, respectively. The dielectric constant for this composition was found to be 2.78.
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