Abstract
Superconducting tunnel junction devices as small as 10 <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">-10</sup> cm <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sup> have been made using novel self-aligning techniques in conjunction with optical or e-beam lithography. This process has been used to fabricate complete circuits and multijunction arrays under well controlled conditions, using a single resist patterning step.
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