High repetition rate ultrashort pulse picosecond laser amplifier

Abstract

We demonstrate a directly diode-pumped Yb-doped high repetition rate ultrashort pulse laser amplifier. The chosen amplifier geometry allows for avoiding chirped pulse amplification which results in a simple and robust ultrashort pulse source that is well suited for industrial micro- and nanomachining applications. The laser system produces average powers on the 10-W-level for pulse repetition rates between 50 and 100 kHz. The pulse duration out of the amplifier is below 2 ps which is about one order of magnitude shorter than that of state-of-the-art picosecond amplifiers based on Nd:YVO. If wanted, the slightly chirped amplified picosecond pulses can be compressed down to about 500 fs pulse duration by using a compact and high efficiency transmission grating compressor.We demonstrate a directly diode-pumped Yb-doped high repetition rate ultrashort pulse laser amplifier. The chosen amplifier geometry allows for avoiding chirped pulse amplification which results in a simple and robust ultrashort pulse source that is well suited for industrial micro- and nanomachining applications. The laser system produces average powers on the 10-W-level for pulse repetition rates between 50 and 100 kHz. The pulse duration out of the amplifier is below 2 ps which is about one order of magnitude shorter than that of state-of-the-art picosecond amplifiers based on Nd:YVO. If wanted, the slightly chirped amplified picosecond pulses can be compressed down to about 500 fs pulse duration by using a compact and high efficiency transmission grating compressor.