Abstract
A previously described radical-assisted sputtering (RAS) coater deposits dense optical thin film with a high deposition rate under low substrate temperature. Film structure and composition at different stages of RAS process are investigated. This process is applied to deposit adjustable optical constant thin film and high-performance optical filters. High process stability of RAS makes precision time termination for multilayer filter deposition. Five runs repeatability of 50% transmittance point of a long wavelength pass filter, stacked by 17 layers SiO 2 and Nb 2O 5, is less than ±1 nm. The refractive index of the mixture film is determined by film composition.
Sign-in/Register to access full text options 
Free) 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a call
