Abstract
A preliminary study of the production and optical properties of d.c. planar magnetron reactively sputtered metal-oxy-fluorine composite materials is presented. The materials were produced using aluminium, indium, niobium, tin, stainless steel, titanium, tungsten and zirconium targets and oxygen plus carbon tetrafluoride reactive gas. Relatively high deposition rates were obtained which depended strongly on the rate of injection of carbon tetrafluoride reactive gas to the sputter zone. Transparent dielectric films were produced with refractive indices n dependent on deposition conditions. Various high rate sputtered transparent materials with low refractive index (from n=1.40 to n≈1.80) produced by this technique have possible applications as antireflection coatings.
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