High-quality Graphitic Carbon Nitride Films Prepared by Close-spaced Thermal Copolymerization for Photoelectrochemical Application

Abstract

Graphitic carbon nitride (CN) is considered to be an attractive material for application in photoelectrochemical (PEC) water splitting cells and photoelectronic devices. However, it is still a challenge to fabricate high-quality CN films. Herein, high-quality CN films have been synthesized via close-spaced thermal copolymerization of dicyandiamide and cyanuric acid for the first time. This method can not only prepare continuous and uniform CN films that grow directly on a conductive substrate but also effectively adjust the film structure (thickness and morphology).