Abstract
We demonstrate that quality factors up to 5000 can be obtained in Tamm-like hybrid metal/semiconductor structures. To do this, a Bragg mirror is covered by a thin transparent layer and a metallic film. The reduced losses of these modes are related to an intermediate behavior between conventional Tamm plasmon and Bragg modes lying deeper in the semiconductor medium. One of the most striking features of this approach is that these super Tamm modes can still be spatially confined with the metal. Confinement on micrometric scale is experimentally demonstrated. The simplicity and versatility of high-Q mode control by metal structuration open perspectives for lasing and polaritonic applications.
Highlights
HAL is a multi-disciplinary open access archive for the deposit and dissemination of scientific research documents, whether they are published or not
We propose a structure based on a geometry similar to the Tamm plasmon and allowing at the same time an increased quality factor and a confinement purely achieved by metal patterning
Its decay length is 0.9 μm, much smaller than the Distributed Bragg Reflector (DBR) thickness (8.9 μm), indicating that in this case the Tamm plasmon (TP) quality factor is limited by the metal rather than by the DBR reflectivity
Summary
HAL is a multi-disciplinary open access archive for the deposit and dissemination of scientific research documents, whether they are published or not. Plasmonic structures present a very small mode volume and allow high emission rate enhancement up to 10003 Their relatively low quality factor can be a drawback for lasing or for strong light matter coupling applications with semiconductors[4]. We propose a structure based on a geometry similar to the Tamm plasmon and allowing at the same time an increased quality factor and a confinement purely achieved by metal patterning. For this purpose, a thin dielectric film is inserted between the DBR and the metal in a conventional Tamm plasmon structure. We will demonstrate that this mode can be confined by a proper patterning of the metallic layer
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