High-Quality-Factor AlGaAs-on-Sapphire Microring Resonators

Abstract

We realize an AlGaAs-on-sapphire platform through Al <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sub> O <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">3</sub> -assisted direct wafer bonding and substrate removal processes. The direct wafer bonding process is optimized concerning the intermediate layer deposition and annealing temperature to obtain a high bonding strength between the AlGaAs and sapphire wafers. High quality-factor (Q) microring resonators are fabricated using electron-beam lithography in which the charging effect is mitigated by applying a thin aluminum layer, and a smooth pattern sidewall definition is obtained using a multi-pass (exposure) process. We achieve an intrinsic Q of up to ~460,000 which is the highest Q for AlGaAs microring resonators. Taking advantage of such high Q resonators, we demonstrate an ultra-efficient nonlinear four-wave mixing process in this platform and obtain a conversion efficiency of -19.8 dB with continuous-wave pumping at a power level of 380 μW. We also investigate the thermal resonance shift of microring resonators with different substrate layouts and observe superior temperature stability for devices in the AlGaAs-on-sapphire platform. The realization of the AlGaAson-sapphire platform also opens new prospects for AlGaAs devices in nonlinear applications in the mid-infrared wavelength range.