Abstract
The described automatic alignment procedure permits an alignment of two successive exposure levels of better than ±50 nm in a deflection field of 600 μm at a beam current of 5×10−10 A within an average time of 3 s even without using a laser interferometer controlled stage.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
