Abstract
High-power laser emission has been observed from xenon fluoride (XeF) at 351.1 and 353.1 nm. A peak laser power of 0.5 MW was obtained by using a mixture of Ar, Xe, and NF3 in the ratio of 250 : 25 : 1 at a total pressure of 1.7 atm. The laser gas was excited by a 1-MeV 20-kA electron beam for a pulse duration of 20 nsec. Energy deposited in the gas by the electron beam was estimated to be 1 J which gives a laser efficiency of 0.5%. Using a coaxial electron gun, an 80-mJ 100-nsec pulse was obtained with an efficiency of 3%.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
