Abstract
High Power Impulse Magnetron Sputtering (HiPIMS) was used for deposition of indium tin oxide (ITO) transparent thin films at low substrate temperature. A hybrid-type composite target was self-prepared by low-pressure cold spraying process. Prior to spraying In2O3 and oxidized Sn powders were mixed in a volume ratio of 3:1. Composite In2O3/Sn coating had a mean thickness of 900 µm. HiPIMS process was performed in various mixtures of Ar:O2: (i) 100:0 vol.%, (ii) 90:10 vol.%, (iii) 75:25 vol.%, (iv) 50:50 vol.%, and (v) 0:100 vol.%. Oxygen rich atmosphere was necessary to oxidize tin atoms. Self-design, simple high voltage power switch capable of charging the 20 µF capacitor bank from external high voltage power supply worked as a power supply for an unbalanced magnetron source. ITO thin films with thickness in the range of 30–40 nm were obtained after 300 deposition pulses of 900 V and deposition time of 900 s. The highest transmission of 88% at λ = 550 nm provided 0:100 vol. % Ar:O2 mixture, together with the lowest resistivity of 0.03 Ω·cm.
Highlights
Optical properties were assessed based on transmission characteristics, which were measured using two spectrophotometers, i.e., Ocean
The thickness clearly visible that coatings areare dense with low micro-porosity of of
2 3 /spherical tin (Sn) targets fabricated by low-pressure spraying were were applied in high impulse magnetron sputtering (HiPIMS)
Summary
The cold-sprayed targets were prepared using mixture of two commercially available powders, spherical tin (Sn) with particles size in the range of −13 + 4 μm (Libra, Trzebinia, Poland), and needle-like indium oxide (In2 O3 ) with particles size in the range of. −1.21 + 0.39 μm, forming a sponge agglomerates (VWR Chemicals, Leuven, Belgium). In mm) with vibration amplitude set to 10 mm and milling time of 30 min. A copper M1E disc with dimensions of 65 × 5 mm was used as a substrate. Prior to spraying the copper substrate was cleaned in acetone and grit-blasted with alumina (mesh 20)
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