Abstract

High Power Impulse Magnetron Sputtering (HiPIMS) was used for deposition of indium tin oxide (ITO) transparent thin films at low substrate temperature. A hybrid-type composite target was self-prepared by low-pressure cold spraying process. Prior to spraying In2O3 and oxidized Sn powders were mixed in a volume ratio of 3:1. Composite In2O3/Sn coating had a mean thickness of 900 µm. HiPIMS process was performed in various mixtures of Ar:O2: (i) 100:0 vol.%, (ii) 90:10 vol.%, (iii) 75:25 vol.%, (iv) 50:50 vol.%, and (v) 0:100 vol.%. Oxygen rich atmosphere was necessary to oxidize tin atoms. Self-design, simple high voltage power switch capable of charging the 20 µF capacitor bank from external high voltage power supply worked as a power supply for an unbalanced magnetron source. ITO thin films with thickness in the range of 30–40 nm were obtained after 300 deposition pulses of 900 V and deposition time of 900 s. The highest transmission of 88% at λ = 550 nm provided 0:100 vol. % Ar:O2 mixture, together with the lowest resistivity of 0.03 Ω·cm.

Highlights

  • Optical properties were assessed based on transmission characteristics, which were measured using two spectrophotometers, i.e., Ocean

  • The thickness clearly visible that coatings areare dense with low micro-porosity of of

  • 2 3 /spherical tin (Sn) targets fabricated by low-pressure spraying were were applied in high impulse magnetron sputtering (HiPIMS)

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Summary

Materials

The cold-sprayed targets were prepared using mixture of two commercially available powders, spherical tin (Sn) with particles size in the range of −13 + 4 μm (Libra, Trzebinia, Poland), and needle-like indium oxide (In2 O3 ) with particles size in the range of. −1.21 + 0.39 μm, forming a sponge agglomerates (VWR Chemicals, Leuven, Belgium). In mm) with vibration amplitude set to 10 mm and milling time of 30 min. A copper M1E disc with dimensions of 65 × 5 mm was used as a substrate. Prior to spraying the copper substrate was cleaned in acetone and grit-blasted with alumina (mesh 20)

Targets Preparation
Magnetron Sputtering Process
Coatings and Thin Films Characterization Methods
Cold-Sprayed
HiPIMS
Cross-section
Surface
Conclusions
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