Abstract
Thin film transistors (TFTs) with amorphous zinc tin oxide (ZTO) channel layer were fabricated by a simple and low-cost solution process. The ZTO thin films are highly transparent (>90% transmittance) in the visible region. The ZTO TFTs fabricated at 400 and 500 °C are operated in enhancement mode. The TFT annealed at 500 °C shows a mobility of 14.11 cm2 V−1 s−1, a threshold voltage of 1.71 V, a subthreshold slope of 0.4 V dec−1 and an on–off current ratio greater than 108. In addition, we investigated the gate bias stability of the TFT. Positive gate bias results in a positive shift of the threshold voltage due to the charge trapping in the channel/dielectric interface.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callSimilar Papers
More From: Journal of Physics D: Applied Physics
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
