Abstract
α-Ga2O3 has gained increasing attention in the field of photodetectors because of its wide bandgap and exceptional chemical and physical properties. Si-doped α-Ga2O3 single-crystal epitaxial films were successfully deposited on sapphire substrates using an affordable and non-vacuum-based mist chemical vapor deposition (Mist-CVD) technique. An interdigital metal-semiconductor-metal (MSM) photodetector with excellent performance was prepared by using the thin film. At 254 nm illumination and a bias voltage of 20 V, the photodetector has a high light-to-dark current ratio of 3.24×106, a responsivity of 3.23×102 A/W, a detectivity of 8.80×1015 Jones, and an external quantum efficiency of 1.58×105%. The results show that Si-doped α-Ga2O3 thin films have great potential for application in high-performance photodetectors.
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