High-performance SiO2-SiNx distributed Bragg reflectors fabricated by ion-assisted reactive magnetron sputtering

Abstract

With the rapid improvement of photonics, the demand for high-performance distributed Bragg reflectors (DBRs) is increasing. In this study, high-performance DBRs stacked by silica and high refractive index silicon nitride layers were designed and fabricated, which were deposited by ion-assisted reactive magnetron sputtering. TEM, EDX, and XPS were utilized to investigate the crystal properties, elemental composition, and bonding properties of the films. Additionally, AFM, SEM, and Raman spectra were used to analyze the morphology, roughness, and stress of DBRs. The result shows that the films prepared by ion-assisted reactive magnetron sputtering are mainly amorphous. DBRs have extremely smooth surfaces with a root mean square roughness (Rq) of approximately 0.5 nm. No obvious defects are found in their surface and cross-section. And the residual stresses of DBRs are relatively low. The reflectance results show that the maximum reflectance of 6-pair DBR on the silicon substrate is higher than 99.9%. The stopband bandwidth covers approximately 800–1150 nm. In this work, DBRs deposited by ion-assisted reactive magnetron sputtering feature high deposition quality, thinness, and broadband high reflection, which have great application potential in high-performance optical devices.