High performance of broadband anti-reflection film by glancing angle deposition

Abstract

This study reports that SiO2 was selected to fabricate broadband anti-reflection (AR) films on fused silica substrates by using glancing angle deposition and substrate rotation. Through accurate control of the graded index of the SiO2 layer, the average residual reflectance of the graded broadband AR film can achieve an average value of 0.59% across a spectral range of 400-1800nm. By comparing the performance, the broadband anti-reflection film with substrate speed has higher stability compared with the broadband anti-reflection film without substrate speed and a higher damage threshold than the traditional anti-reflection film.