High LIDT photosensitive organic-inorganic hybrid materials for nanoimprint lithography (Conference Presentation)

Abstract

Nanoimprint lithography (NIL) is a technique suitable for the mass production of micro-optical elements using a mould. One drawback, however, is that the materials used in NIL have low laser-induced damage threshold (LIDT). Here, we present our results in the development of a series of high-LIDT organic-inorganic hybrid materials, and their application in NIL using moulds made by multiphoton lithography.