Abstract
Abstract Optics manufacturing technology is predicted to play a major role in the future production of integrated photonic circuits. One of the major drawbacks in the realization of photonic circuits is the damage of optical materials by intense laser pulses. Here, we report on the preparation of a series of organic–inorganic hybrid photoresists that exhibit enhanced laser-induced damage threshold. These photoresists showed to be candidates for the fabrication of micro-optical elements (MOEs) using three-dimensional multiphoton lithography. Moreover, they demonstrate pattern ability by nanoimprint lithography, making them suitable for future mass production of MOEs.
Highlights
Micro-optical elements (MOEs) are ideal candidates for optical applications such as beam focusing, shaping, and steering elements [1]
One of the highest resolution additive manufacturing (AM) techniques is multiphoton lithography (MPL), which has allowed the freeform 3D printing of complex microoptical elements and components such as complex lenses and microscopes objectives [2,3,4], metalenses [5, 6], stacked metasurfaces with multilevel advantages enabled by MPL [7], axicons [8], and Fabry–Perot resonator [9] on flat substrates, as well as on optical fibers [10,11,12,13,14,15]
There is a wide variety of photosensitive materials used that can be employed, including biomolecules, organic photopolymers, and hydrogels, or organically modified ceramics [18,19,20]
Summary
Micro-optical elements (MOEs) are ideal candidates for optical applications such as beam focusing, shaping, and steering elements [1]. There is a wide variety of photosensitive materials used that can be employed, including biomolecules, organic photopolymers, and hydrogels, or organically modified ceramics [18,19,20] The latter class of materials is suitable for MOE fabrication, as they can be structured accurately with minimal shrinkage, keeping their transparency at visible and near-infrared (NIR) wavelengths [21,22,23,24]. Most of these materials have a low laser-induced damage threshold (LIDT), as a result of their high organic content [25, 26]. This makes them suitable only for low-power laser applications
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