Abstract

A high-intensity UV light source is required in the fields of bacilli sterilization, material processing and so on. When a continuous sinusoidal voltage waveform is applied between the electrodes of a mercury-argon lamp, the UV emission shows saturation effect because of the presence of a resonance line of mercury. We tried to control the plasma condition by using a pulsed power supply. The cold-cathode mercury-argon lamp used was 180 mm long and 6.0 mm in diameter. A square-like pulsed waveform whose frequency and duration were 70 kHz and 5 µs, respectively, was alternately applied between the electrodes. As a result, the 254 nm UV emission intensity was achieved, which was 30-fold that obtained by applying 30 kHz continuous sinusoidal waveform.

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