Abstract
Front Cover: In article 1900514 by Joona Bang, Sung Gap Im, and co-workers, a robust neutralization methodology is developed to neutralize the two interfaces in a block copolymer film via initiated chemical vapor deposition. A highly uniform film of crosslinked AB-type random copolymers, sandwich an AB-type block copolymer film to produce perpendicular sub-5 nm nanodomains.
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