Abstract
We report progress in using nanoimprint lithography to fabricate high fidelity blazed diffraction gratings. Anisotropically etched silicon gratings with 200nm period and 7.5° blaze angle were successfully replicated onto 100mm diameter wafers with subnanometer roughness and excellent profile conformity. Out-of-plane distortion induced by residual stress from polymer films was also analyzed and found to be extremely low. The replicated blazed gratings were tested and demonstrated high x-ray diffraction efficiencies. This process was developed for fabricating blazed diffraction gratings for the NASA Constellation-X x-ray telescope.
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