Abstract
The term “P-beam writing” is used to describe the technique of using focused high energy proton microbeams for micro or nanofabrication applications. The P-beam technique can be used to rapidly fabricate three-dimensional, high aspect ratio microstructures in a variety of materials without the use of masks and it is proving to be a versatile lithographic method. Recent developments in the application P-beam writing of microstructures at the Louisiana Accelerator Center are presented.
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Schedule a callMore From: Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
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