Abstract
Band structure and optical gain properties of AlInGaN/AlInGaN-delta-AlGaN quantum wells for deep-ultraviolet light emitting and lasers diodes with wavelength λ ∼229 nm and TE-polarized optical gain peak intensity ∼1.7 times larger than the conventional AlInN-delta-GaN was proposed and investigated in this work. The active region is made up of 20 Å staggered Al0.89In0.03Ga0.08N/Al0.8In 0.01Ga0.19N layers with a 3 Å Al0.46Ga0.54N delta layer. The use of the quaternary AlInGaN well layer permits the independent control of the band gap and the lattice parameter, so that the internal electric field induced by polarizations can be reduced and interband transition energy increases. Therefore, we can predict that the optical performance of the AlInGaN-delta-AlGaN is more convenient for an emission in the deep-ultraviolet than that of the conventional AlInN-delta-GaN-based quantum wells.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
