Abstract
We have developed a repetitively pulsed cathodic arc plasma source that can operate at high duty cycle and with long lifetime between downtimes for cathode maintenance. The arc discharge current can be up to 300 A, the arc pulse width can be varied from 0.1 to 4 ms, and the source can operate at a duty cycle of up to 30% for many hours. The cathode can be of a diameter from 20 to 40 mm, and can be easily and quickly changed. A 45° magnetic duct is used for macroparticle filtering, employing a pulsed magnetic field. We have operated the source over a wide parameter range, and we report here on the variation of plasma ion deposition current with arc current, duct magnetic field, and duct bias voltage. A momentary ion deposition current of 0.7 A was obtained with the source running stably for more than 8 h with an arc current of 100 A and duty cycle of 20%.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
