Abstract
We fabricated DO3-orderd Fe3Si-nanodots (NDs) on ultrathin SiO2 and evaluated local I-V characteristics through individual dots under magnetic field application by using atomic force microscopy (AFM) with a magnetic cantilever. High-density Fe-silicide NDs with an areal density as high as ~1011 cm-2 were formed on thermally grown SiO2 by exposing ultrathin Fe/amorphous-Si/Fe tri-layer stacked structures to a remote H2 plasma without external heating. The formation of DO3-orderd NDs was confirmed by X-ray diffraction and magnetization measurements. From local electron transport properties, a clear change in resistance depending on the magnetization direction of Fe3Si-NDs with respect to the CoPtCr-coated AFM tip was confirmed at room temperature.
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