Abstract
ABSTRACTHigh-purity, polycrystalline foils of 12 atomic percent gold Ag-Au alloy were implanted with polyatomic ions of arsenic and antimony at energies of 45 keV per atom. During fluence intervals before and after the steady state, sputtered material was collected on high-purity strips of aluminum foil. Subsequent backscattering analysis of the targets and collectors showed that significant redistribution and segregation occurred in the implanted layer, with relative depletion of silver consistently observed. The results suggested that preferentiality in sputtering is dependent on composition of an alloy and the ion beam used (even at low fluence), but there appears to be no major difference between the redistribution behavior of targets sputtered with atomic ions and equal-velocity molecular ions.A model is presented which predicts the sputtering behavior and surface configuration of a binary alloy implanted to steady state with a third species.
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