Abstract
Characteristics of a source of laser-induced radiation in the extreme ultraviolet (EUV) range, obtained in a discharge between two jets of liquid tin, are investigated. The possibility of designing a high-brightness EUV source on this basis for employing in mask inspection techniques in projection EUV lithography is demonstrated. The average efficiency of converting the electric energy to radiation in the spectral range of is approximately sr with the size of emitting plasma . The possibility of producing a EUV source with a brightness of about is demonstrated.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
