Abstract
This paper presents accurate device models (1-3 percent) to describe the I_{D}-V_{D} electrical characteristics of surface-channel PMOS transistors in strong inversion, and ion-implanted depletion-mode buried-channel PMOS transistors. The primary emphasis is an accurate description of the transverse carrier mobility with distance and normal electrical field in long-channel structures. The influence of substrate bias on carrier mobility in the surface-channel device is modeled theoretically and verified by experiment. The carrier mobility in the buried-channel devices is constant as determined experimentally with gated-diode C-V and conductance measurements. The modeling parameters are determined at V_{D} = 0 with an automated data-acquisition micro-processor-controlled system. The models are analyzed with a least squares estimation criterion and a high degree of internal consistency is apparent from the statistical significance of the results.
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